- 作者: 何武靜; 牛博俊; 張世民; 何世延
- 作者服務機構: Department of Chemistry, National Tsing Hua University, Hsinchu, Taiwan, R.O.C.
- 中文摘要: In the photolysis of acetone at 265nm at 27.degree.C the quantum yield of biacetyl has been determinated to be 0.34 and the primary decomposition yield is evaluated to be about 0.68. The fraction of triplet acetone decomposed into methyl and acetyl radicals is estimated to be 0.14 at 313nm. The acetyl radicals undergo reaction to form biacetyl 50 times faster than decomposition to methyl radicals and carbon monoxide.
- 英文摘要: --
- 中文關鍵字: The photochemistry of acetone.
- 英文關鍵字: The photochemistry of acetone.