• 作者： 李玉華; 陳英堂; 吳修雲
• 作者服務機構： 成功大學物理系; 中山科學研究院
• 中文摘要： 本文旨在探討製程加熱對類鑽石炭膜之微觀結構產生的影響。非晶的含氫類鑽石膜為採輻射交流頻濺鍍法製備，製程加熱含兩種不同方式，一者為基底不加熱，但施以不同的濺鍍功率，另者固定濺鍍功率為300W，但改變基底的加熱溫度。薄膜之微觀結構採紅外光吸收及拉曼散射等兩種技術分析。實驗結果顯示膜層之氫含量對薄膜性質及微觀結構具決定性影響。在低功率或低基底溫度下製得之炭膜含大量的氫，且大部分的氫都與炭結成CH 的鍵結形式，至於該膜層內所含之石墨形式的鍵結由拉曼散射結果得知為無序之非晶結構，當基底之溫度提高時，膜層內的氫含量即隨著溫度的上升而逐漸溢出膜層，同時Sp 的石墨微晶粒也逐漸形成，在基底溫度達到600℃時，幾乎已無氫原子殘留在膜層內，膜層即石墨化。
• 英文摘要： Amorphous hydrogenated carbon films were prepared by using an rf-sputtering technique. Twotypes of samples were made. One type was made with different sputtering powers and no intentionalheating of the substrate. Another type was made with a fixed power of 300 W and isochronal heatingof the substrate with different temperatures. The structures of the thin films were characterized by infraredabsorption and Raman spectroscopy. The results indicate that the incorporated hydrogen concentrationwas an important parameter in determining the structure and properties of the films. Carbon films depositedat the low sputtering powers or substrate heating temperatures contained a large amount of hydrogen withmost of the C-H bonds in CH configurations. According to Raman scattering measurements, the spdomains in the samples manufactured at the low sputtering powers or substrate heating temperatures weredisordered due perhaps to bond angle distortions. Upon substrate heating, fewer and fewer hydrogen atomswere incorporated into the carbon films, and sp microcrystallites were formed! At a substrate temperatureof 600℃, almost no hydrogen remained in the film, and graphitization took place.
• 中文關鍵字： Raman spectroscopy; infrared absorption; diamond-like carbon films
• 英文關鍵字： --