- 作者: Wan, C. C.; Chen, H. Y.; Linford, H. B.
- 作者服務機構: National Tsing Hua University, Hsinchu, Taiwan, R.O.C.
- 中文摘要: --
- 英文摘要:
This invesitigation is concerned with the drop of current efficiency of
copper deposition under pulsed current conditions.
A model which was based on different reaction rates between the two following
reactions,
Cu+++e¯→Cu+
Cu++e¯→Cu
was roposed to explain the experimental observations. Qualitative confirmation of
this mechanism was made by three independent experimental methods. In addition,
systematic experimental measurements on the current efficiency were carried out
under variety of conditions on a rotating disk electrode. - 中文關鍵字: --
- 英文關鍵字: --