• 作者： Hong, Lu-Sheng; Lai, Harn-Tzong
• 中文摘要： 本文提案以微粒子輔助化學氣相沈積法(PPCVD)來修飾無機多孔基材的孔洞結構。相對於傳統CVD法在孔洞內壁形成緻密膜，PPCVD法乃以氣相合成的微粒子沈基在孔洞內部或表面上形成多孔層，使基材孔徑減小時還能保持較大的透過率。本實驗的反應系統為矽甲烷/乙炔/氨在1,323K下生成碳化矽/氮化矽複合微粒子後，令其沈降在多孔基材上。由氣體透過測試發現基材的平均孔洞半徑由 2.61微米減至1.57微米時僅隨伴20%的透過率下降，比傳統CVD減少了43%的透過率下降。此乃因修飾層具有比孔洞基材約大一倍的孔隙度所致。
• 英文摘要： A technique termed as the particle precipitation aided chemical vapor deposition (PPCVD) was utilized to modify the pore structure of an inorganic porous support. In contrast to the traditional CVD modification processes which form dense films on the pore wall, PPCVD modifies the pore structure by piling up fine particles in/on the porous support to reduce the pore size but maintaining a large permeability. The reaction system used was SiH/sub 4//C/sub 2/H/sub 2//NH/sub 3/ which generated SiC/Si/sub 3/N/sub 4/ composite particles in the gas phase to be deposited on the support at 1,323K. Single gas permeation measurements of the support before and after modification showed that a decrease of the average pore radius from 2.61 to 1.57.mu.m was accompanied by only 20% of permeability loss, i.e., 43% reduction of the permeability loss was achieved as compared to that obtained from the traditional CVD processes. Analysis of the pore structure based on the gas permeation data showed that the porosity of the modification layer is 1.1 times larger than that of the original support.
• 中文關鍵字： 微粒輔助化學氣相沈積; 無機薄膜; 孔洞修飾; 滲透率; 孔隙率; 化學氣相沈積
• 英文關鍵字： Particle Precipitation Aided Chemical Vapor Deposition; Inorganic Memebrane; Pore Modification; Permeability; Porosity; Chemical Vapor Deposition (Cvd)