- 作者: 張志維 ; 劉兆玄 ; 李紫原
- 作者服務機構: 清華大學化學系
- 中文摘要: The reactions of SiF/sub 2//SiF/sub 4/ with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et/sub 3/N, HNEt/sub 2/, PR/sub 3/, PR/sub 2/Cl), SiF/sub 2/ inserts initially into SiF/ sub 4/, to form Si/sub 2/F/sub 6/, which was followed by subsequent reactions leading to products containing SiF/sub 3/ groups. This is the first report of the insertion of SiF/sub 2/ into SiF/sub 4/. When the reactants were a weaker base (such as RPCl/sub 2/, CX/sub 3/Br, X=F, Cl), insertion of SiF/sub 2/ into P-Cl and C-Br bonds became predominant.
- 英文摘要: --
- 中文關鍵字: Difluorosilylene; Amine; Phospine; Insertion; Halomethane; Tetrafluorosilane
- 英文關鍵字: 二氟矽烯;胺類;磷酸化物;插入;鹵甲基化作用;四氟矽烷