• 作者： Wang, Ching-Huei; Weng, Hung-Shan
• 中文摘要： 本研究藉由BET表面積,X射線光電子光譜(XPS),程溫還原(TPR)與氨程溫脫附(NH/sub 3/-TPD)分析及活性測試,探討CuO/Sulfated-Al/sub 2/O/sub 3/之特性及其用於甲烷與二硫化二甲基氧化分解反應之催化活性。實驗結果發現CuO/Sulfated- Al/sub 2/O/sub 3/觸媒活性比CuO/Al/sub 2/O/sub 3/及 Pt/Al/sub 2/O/sub 3/觸媒為高。由XPS及TPR分析結果得知, CuO/Sulfated-Al/sub 2/O/sub 3/觸媒表面有 SO/sub 4//sup -2/的存在,且由NH/sub 3/- TPD分析發現經H/sub 2/SO/sub 4/處理的觸媒,其表面酸性有顯著增加,因此作者認為酸處理是擔體觸媒活性明顯增加之原因。
• 英文摘要： By performing BET surface area, X-ray photoelectron spectroscopy (XPS), temperature-programmed reduction (TPR) and ammonia temperature programmed desorption (NH/sub 3/- TPD) analyses as well as activity test, this study investigated the characteristics of the sulfated-alumina supported CuO (CuO/sulfated-Al/sub 2/O/sub 3/) catalyst and its activity for the oxidative decomposition of both CH/ sub 4/ and (CH/sub 3/)/sub 2/S/sub 2/. Experimental results indicate that the CuO/sulfated-Al/sub 2/O/sub 3/ catalyst exhibited a higher activity than CuO/Al/sub 2/ O/sub 3/ and Pt/Al/sub 2/O/sub 3/. XPS and TPR analyses suggest that it might have the functional group of SO/sub 4//sup -2/ which existed on the surface of the CuO/sulfated- Al/sub 2/O/sub 3/ catalyst. The NH/sub 3/-TPD pattern also reveals that the H/sub 2/SO/sub 4/-treatment remarkably enhances the acidity of the catalyst. Therefore, we believe that the substantial increase in activity is attributed primarily to the SO/sub 4// sup -2/ group on the catalyst surface.
• 中文關鍵字： 甲烷; 二硫化二甲基; 氧化分解; 氧化銅; 觸媒; 活性
• 英文關鍵字： Methane; Dimethyl Disulfide; Oxidative Decomposition; Copper Oxide; Catalyst; Activity