- 作者: 林榮慶; 吳文章
- 作者服務機構: 國立臺灣科技大學機械工程學系
- 中文摘要: 覆蓋精度(overlay)控制為積體電路製造的關鍵設計準則之一。本文將探討覆蓋精度之數學模式,研究步進機(stepper)之光罩與晶圓(wafer)對準不正確對覆蓋誤差的影響。在本文的分析方法中,深入討論各獨立參數(parameter)與覆蓋誤差之閒的關係,包括各獨立參數造成覆蓋誤差的幾何特徵,分析曝光場(image field)形狀改變、曝光場大小改變、以及樣本(samples )取樣數目改變等對覆蓋誤差的影響。 結果顯示,在幾何特徵方面,曝光源與光罩之配合誤差(intrafield sources)所造成之覆蓋誤差與曝光場大小有關,而光罩與晶圓之配合誤差(interfield sources)則和曝光場的位置有關,因此晶圓直徑越大,曝光場距離晶圓中心越遠其覆蓋誤差越大。在統計資料特性方面,得到的結論是曝光場大小相同下,正方形的曝光場設計優於長方形。光罩與晶圓之配合誤差對覆蓋誤差的靈敏度大於曝光源與光罩之配合誤差,當曝光場的面積及晶圓直徑越大,高階誤差參數對覆蓋精度的影響越加重要。本文分析方法可作為步進機在控制覆蓋精度時,配合曝光場的大小及形狀,選擇影響較大的獨立參數來加以控制。
- 英文摘要: The control of overlay tolerance is one of the key design rules in the manufacturing of integratedcircuits.This paper explores the mathematical model of overlay accuracy and examines the effects ofa stepper mask and inaccurate wafer positioning on the overlay.The analysis in this paper includes anin-depth discussion of the relationship between every independent parameter and the overlay, includingthe overlay geometry due to various parameters, analysis of changes in the shape of the image field, changesin the field size and the effect of changes in the number of samples on the overlay. The findings indicate that in terms of the geometry, the overlay of intrafield sources is related tothe field size while that of interfield sources is related to the field position. Therefore, the larger thewafer diameter is,the greater is the distance between the field and wafer center, and the larger is theoverlay.In terms of statistical data characteristics, the conclusion is that given the same field size,asquare image field design is superior to a rectangle design.The sensitivity of interfield sources to theoverlay is greater than that of intrafield sources. The greater the image field area and the larger the waferdiameter is,the more important is the effect of high-order parameters on the overlay. These findingscan be used, in conjunction with the size and shape of the image field, to select parameters which willbe effective in controling the overlay accuracy of the stepper.
- 中文關鍵字: stepper; overlay; alignment; error parameters
- 英文關鍵字: --