• 作者： 李玉華; 劉家呈; 吳修雲
• 作者服務機構： 成功大學物理系; 中山科學研究院
• 中文摘要： 本文旨在探討以濺鍍之物理氣相沈積法製造類鑽石含氫碳膜的可行性。我們選擇在一高壓（方程式無法摘錄），及一低壓（方程式無法摘錄）的兩個不同條件下製造樣品，使用之濺鍍氣體為Ar及H2之混合氣體，氣體分壓比為一重要之控制參數，我們發現在高濺鍍氣壓下，分壓比約在15左右，濺鍍速率可以提升5倍，並且所獲得之類鑽碳膜硬度高，密度大，其密度為2g／cm，硬度為2000 kgf/m㎡，同時這些薄膜具有較寬的光學能隙（～2ev），及較多的正四面體鍵結（～80％）。
• 英文摘要： The feasibility of using the rf-sputtering technique in making amorphous diamond-like hydrocarbonfilms was studied. The sputtering gases were a mixture of argon and hydrogen. Two conditions of differenttotal pressures of (方程式無法摘錄) torr and (方程式無法摘錄) torr were used We found that the partial pressure ratio of argonto hydrogen was an important parameter, which could be controlled to give a high deposition rate andhard diamond-like films. The most densive and hardest films(density around 2 g/cm, hardness arourid2000 kg f/m㎡) were obtained with the high total pressure condition with a partial pressure ratio of around15. These films also had the largest optical gap(～2ev) and greatest number of type bondings(～80%).
• 中文關鍵字： diamond-like; hydrogenated diamond-like; thin films; rf-sputtering
• 英文關鍵字： --