- 作者: Yuh-Wern Wu, Mei-Lee Hwang, Wei-Liang Hsu and Fen-Hui Fang
- 中文摘要: The photolysis of propargyl bromide in Ar matrix to from allenyl bromide proceeded with a radical mechanism. The deuterium label study and radical scavenger were used to investigate the mechanism. Neither propargyl nor allenyl radical was trapped in Ar matrix at 8K. The rates of propargyl and allenyl radicals coupled with bromo radical are significantly fast. The stability of propargyl and allenyl radicals is discussed.
- 英文摘要: --
- 中文關鍵字: --
- 英文關鍵字: --