- 作者: 孫揚名 ; Sloan, D. ; White, J.M.
- 作者服務機構: Dept. of Chemistry
- 中文摘要: The surface chemistry, induced by thermal and non- thermal methods, of SO/sub 2/ on metal substrates is reviewed. The substrate temperature during dosing is important; regardless of metal, adsorption is dissociative at 300K and molecular at 100K. On Ni, Pd, and Pt, molecular adsorption occurs through the S and one O atom, and the molecular plane is perpendicular to the surface. However, on Ag and Cu, adsorption occurs only through the S with the molecular plane perpendicular to the surface. The differences can be attributed to the structure of the metal's molecular orbitals and their interactions with the SO/sub 2/ orbitals. Upon heating, SO/sub 2/ dissociates on all transition metal surfaces with the exception of Ag, Au, and Cu, where only molecular desorption occurs. On Pt, Fe, and Pd, additional reactions are observed between SO/sub 2/ and its dissociation products. The nonthermal reactions induced by photons and electrons for monolayer coverages of SO/sub 2/ on Ag(111) are dominated by molecular desorption. Desorption cross sections for 313nm photons and 50eV electrons were 2.8*10/sup -20/cm/sup 2/ and about 1* 10/sup -16/cm/sup 2/, respectively. Nonthermal excitation mechanisms and quenching processes as well as interesting characteristics of SO/sub 2/ under irradiation are also reviewed.
- 英文摘要: --
- 中文關鍵字: Sulfur Dioxide; Surface Analysis; Temperature; Adsorption; Desorption
- 英文關鍵字: 二氧化硫;表面分析;溫度;吸附;去吸附