• 作者： 施英明
• 作者服務機構： 國立清華大學材料科學系
• 中文摘要： 本文係針對以電惑應為熱源之高速度鋁、銅、金真空蒸鈹過程中所遭遇之濺液問題所從事研究之報告。於實驗過程中作者曾用新力公司之電視攝影機拍照蒸鍍時所產生之一種明麗之「濺泉」。而混有濺液之鍍膜，也經掃描式電子顯微鏡加以觀察與分析，由此觀察之結果，作者提出「濺泉形成之原理」並提供防止濺泉產生之簡單方汰，作者發現坩堝與被蒸鍍之金屬液間之材料性質與相互關係乃是防止濺泉形成之主要考慮重默，適當之安排將能以高速度蒸鍍無濺液之金屬膜。相反，亦可利用同一原理於真空中促進「濺泉」之產生，俾用於製造高純度之金屬微粒粉末。
• 英文摘要： Splattering problem has been studied during the high rate depositionof aluminum, copper and gold utilizing an induction heated source. Avivid splattering fountain had been observed and was recorded by a Sony'svideocorder. Films with splatter particles were observed and analyzed bya scanning electron microscope. The mechanism of the formation of thiskind of splattering fountain is discussed and methods to avoid it are alsoproposed. The material and thickness of the crucible should be correlatedwith the material to be evaporated in order to eliminate the splatteringfountain and obtain useful, films. It is also proposed that by applying sameprinciples, metallic powders of high purity can be produced in the vacuumsystem utilizing an induction heated source.
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