- 作者: Bu, Y. ; Lin, M.C.
- 作者服務機構: Dept. of Chemistry, Emory Univ., Atlanta, Georgia, U.S.A.
- 中文摘要: The adsorption and thermal decomposition of ketene on Si(111)-7*7 were investigated using various surface analysis techniques. When the surface was exposed to ketene at 120K, two CO stretching modes at 220 and 273 meV appeared in HREELS, corresponding to two adsorbed ketene states. After the sample was annealed at .sim.250K, the 273 and the 80meV peaks vanished, indicating the disappearance of one of the adsorption states by partial desorption of the adsorbate. In a corresponding TPD measurement, a desorption peak for ketene species was noted at 220K. Annealing the sample at 450K caused the decomposition of the adsorbate, producing CH/sub x/ and O adspecies. Further annealing of the surface at higher temperatures resulted in the breaking of the CH bond, the desorption of H and O species and the formation of Si carbide. The desorption of H at 800K was confirmed by the appearance of the D/sub 2/ (m/e=4) TPD peak at that temperature when CD/sub 2/CO was used instead of CH/sub 2/ CO.
- 英文摘要: --
- 中文關鍵字: Adsorption; Thermal Decomposition; Surface Analysis; Ketene; Temperature
- 英文關鍵字: 吸附;熱分解;表面分析;乙烯酮;溫度