• 作者： Ju, Y. H.; Liu, C. J.; Hsieh, J. C.
• 中文摘要： 真空蒸鍍鉛花青薄膜之表面形態及晶相結構受膜成長時蒸鍍速率及其板溫度之影響。在本研究所使用之基板溫度(25-250℃)及蒸鍍速率(0.1-5.0nm/s)範圍內，低基板溫度及高蒸鍍速率有利於生成非晶相膜；高基板溫度及低蒸鍍速率則有利於高結晶度β相之生成。基板溫度及蒸鍍速率在中間值時則有利於α相薄膜之成長。在感測二氧化氮氣體時，由於β相薄膜結構顆粒較大，因此應答速率最慢；非晶相薄膜則因其多孔性結構而有最快之應答。
• 英文摘要： The morphology and crystal structure of vapor-deposited lead phthalocyanine (PbPc) thin film depends on the substrate temperature and deposition rate. In the range of substrate temperature(25-250. degree.C) and deposition rate (0.1-5.0nm/s) employed for the growth of PbPc thin films in this work, low substrate temperature and high deposition rate favor the formation of amorphous films. On the other hand, high substrate temperature and low deposition rate yield.beta. phase film with high crystallinity. .alpha. phase film can be obtained under moderate substrate temperature and deposition rate. Film with .beta. structure has the slowest response in gas sensing due to its larger particle size while amorphous film with its porous structure has the fastest response in gas sensing.
• 中文關鍵字： 鉛花青; 蒸鍍速率; 基板溫度; 氣體感測器; 真空蒸鍍
• 英文關鍵字： Lead Phthalocyanine; Deposition Rate; Substrate Temperature; Gas Sensor; Vacuum Deposition