- 作者: 許鉦宗; 蔣敏雄; 蘇翔
- 作者服務機構: 行政院同步輻射研究中心; 國立交通大學電子工程學系
- 中文摘要: 聚焦環做為X光微焦環元件在X光光學中有許多的運用。本文主要探討X光掃描式顯微術中所需之π-相位移聚焦環之製作及理論摹擬並提出結果。聚焦環之製作是利用多矽氮化矽為鼓膜並以銘-鎢-銘三層金屬為X光吸收劑,多矽氮化矽膜是利用低壓化學氣相沈積系統沈積在(100)矽晶片並以氫氧化鉀進行矽基材背向蝕刻而形成鼓膜,X光吸收劑則以電子束進行微影蝕刻且以活性離子蝕刻(RIE)以形成聚焦環圖形。最後,外環0.8微米pi-相移聚焦環之掃描式電子顯微影像在本文中提出。
- 英文摘要: In x-ray applications, x-ray zone plates are very useful as microfocusing components in x-ray optics.This paper presents both theoretical consideration and the fabrication procedure for producing π-phaseshift x-ray zone plates for x-ray focusing in the range of 800 eV to 1700 eV in x-ray scanning photonemission microscopy by x-ray mask technology. The x-ray zone plates are fabricated on 0.7 μm low-stress silicon-rich silicon nitride membranes with tri-layer Chromium-Tungsten-Chromium (Cr-W-Cr) as x-ray absorbers instead of Nickel or Gold. The film is deposited on the (100) siliconsubstrate using low pressure chemical vapor deposition (LPCVD), and the free standing membranes areformed by means of KOH silicon backside etching. With e-beam lithography and reactive ion etching,a width of 0.8 μm of outmost zone of the x-ray zone plates was obtained. Scanning electron microscopy(SEM) images of the x-ray zone plates are shown.
- 中文關鍵字: x-ray scanning microscopy; x-ray mask; zone plate; membrane; x-ray absorber
- 英文關鍵字: --