• 作者： 吳光雄
• 作者服務機構： 國立交通大學電子物理系
• 中文摘要： 本文研究混氣中加氬氣和電極結構中加輔助電極對一部小型橫向放電二氧化碳雷射輸出功率和放電穩定的影響。 我們發現本系統可在不加氦氣，只加氬氣之混氣下穩定放電，其輸出功率比在純氦氣之混氣情況下還高。而當氫氣和氦氣比例各佔一半時，其輸出功率達到最高。由實驗得知，在混氣中加氬氣會使小信號增益增加。 在輝光放電中加一簡單的直流輔助放電電極，可使主放電更趨穩定，因而可輸入更多的功率，且可在較高的氣壓下操作。本系統將用於電子材料或半導體元件之處理。
• 英文摘要： The influences of Ar gas and an auxiliary electrode on the output power and discharge stability of atransversely excited (TE) CW CO laser have been investigated. It was found that the present system could be operated stably by adding pure Ar in the gas mixture,and the output power was higher than that of the conventional C0 -N -He mixture. Futhermore, anoptimum laser output was obtained by choosing a mixed ratio of He：Ar＝1：1. Experiments showed thatthe small signal gain of the laser medium tended to increase with an increase in the proportion of Ar gas. A simple rod electrode was used to produce a DC auxiliary discharge. With it, a stable glow dis-charge was obtained at higher pressure and higher discharge input. This laser system will be used to studythe processing of electronic components and semiconductor devices.
• 中文關鍵字： TE Co2 laser; DC auxiliary discharge; he-free gas mixture
• 英文關鍵字： --