- 作者: YAO CHENG ; BOR-YUANSHEW ; CHING-YAO LIN ; DER-HSINWEI
- 中文摘要: This paper reports the recent development breakthrough and achievement of special deep x-ray lithography at the Synchrotron Radiation Research Center (SRRC). The features of the ultra-deep LIGA (Lithography, Gavanoformung, and Abformung) process developed at SRRC are introduced and compared with those of conventional LIGA technology. This article covers the setup of key elements required for the deep x-ray lithography process at SRRC. This includes the Taiwan light source (TLS), beamline, exposure system, x-ray mask, photoresist, substrate and exposure doses. After three years of development, deep x-ray lithography at SRRC has now become far more mature and reliable. It now has real value for basic research and industrial application.
- 英文摘要: --
- 中文關鍵字: synchrotron radiation, deep x-ray lithography, LIGA process, micromachining, MEMS, thick film, high aspect ratio, microstructure
- 英文關鍵字: --