- 作者: 蘇昭瑾,陳志成,蔡枝松,林榮良,林景泉
- 作者服務機構: Institute of Atomic and Molecular Sciences, Academia Sinica, P. O. Box 23-166, Taipei 106, Taiwan, R.O.C.
- 中文摘要: The thermal reactions and photochemistry of monolayer methyl iodide (CH3I) on a silver covered TiO2(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ~ 60% of CH3I at monolayer coverage on Ag/TiO2(110) dissociates between 130 and 200 K yield adsorbed CH3 and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH3I on Ag/TiO2(110) is wavelength dependent. Irradiation of monolayer CH3I by 404 nm photon causes C-I bond dissociation and CH3 desorption. Upon 290 nm, UV irradiation, the depletion of CH3I(a) is dominated by photodesorption of molecular CH3I.
- 英文摘要: --
- 中文關鍵字: TiO2(110); CH3I; Adsorption; Photochemistry.
- 英文關鍵字: --