- 作者: Chu, Chih-Wei; Lee, Eric
- 中文摘要: 本研究採用數值模擬以分析水平冷壁式化學蒸鍍反應器內之氣體流場,溫度場,及濃度場。對流所產生之渦流為探討之主體。不同傾斜角之基板產生不同大小及形態之渦流,影響質傳現象,進而影響蒸鍍膜之均勻度。本研究發現傾斜基板可增進薄膜均勻度。
- 英文摘要:
We perform a numerical simulation of the gas flow pattern, and the temperature and concentration distributions in a horizontal cold wall atmospheric CVD reactor with an adjustable tilt angle of the susceptor. The effects of mixed convection on heat and species transport are also examined in the range 2
- 中文關鍵字: 化學氣相沈積; 傾斜基板; 輸送現象; 流態; 溫度; 濃度
- 英文關鍵字: Chemical Vapor Deposition; Inclined Susceptor; Transport Phenomena; Flow Pattern; Temperature; Concentration