• 作者： Cheng, Yang-Chu; Yu, Ding-Kuo; Lee, Yuan-Haun
• 中文摘要： 在此論文中,高純鋁箔在含有不同氯離子濃度(2*15/sup -5/至5*10/sup -3/N的硼酸溶液中,以-2.2V(相對於銀/氯化銀參考電極)的電位加以陰極極化處理,然後再做研究。在不同溶液情況下,測量塔弗斜率,以確定陰極還原的清淨效果。此外,使用低速率線性掃描電壓法來研究氯離子濃度在陰極還原處理中的效應。為了尋求電蝕鋁箔製造中前處理程序的最佳條件,本研究以不同pH和氯離子濃度情況下所得的電量做比較。不同pH值之下鋁箔表面上氧化膜的結構也加以研究。
• 英文摘要： In this work, high purity aluminum foil polarized cathodically at -2.2V (Ag/AgCl) in boric acid solution containing various Cl/sup -/ concentrations (2*10/sup -5/ to 5*10/sup -3/N) was investigated. Variations of Tafel slope under different solution conditions were measured to ascertain the cleaning effect of cathodic reduction. In addition, low scan rate linear sweep voltammetry was used to study the effect of Cl/sup -/ concentrations in the cathodic reduction treatment. To establish the optimum conditions for pretreationg process in the fabrication of etched aluminum foil, electrical charges for different pH and Cl/sup -/ concentration were compared. The structure of the oxide film on the foil for different pH values was also explored.
• 中文關鍵字： 線性掃描伏安法; 腐蝕鋁箔; 電荷; 預處理; 陰極還原; 陽極氧化; 靜電位; 孔層; 障礙層; 免疫區域
• 英文關鍵字： Linear Sweep Voltammetry; Etched Aluminum Foil; Electric Charge; Pretreatment; Cathodic Reduction; Anodic Oxide; Rest Potential; Porous Layer; Barrier Layer; Region Of Immunity